Entries by martina.desio

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LPCVD

Low-Pressure Chemical Vapor Deposition (LPCVD) is a thermal process used to produce thin films materials from a precursor gas at sub-atmospheric pressures. Typical available materials include amorphous silicon, polysilicon, silicon oxide and silicon nitride.

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Photonic Circuits and Devices

Silicon nitride passive photonic elements, integrated circuits and devices operating in the VIS-NIR (450-1100 nm) tailored for user-specific applications. Designs can include elements selected from the laboratory’s designs or defined by the users according to their specifications and requirements. We also offer our expertise for the co-creation of new photonics elements, devices and circuits. You design it, we create it for you.