Tag Archive for: Deposition of conventional spintronic materials by Sputtering Ion Beam Etching with in situ XPS analysis
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Molecular Beam Epitaxy (MBE) for spintronics
Showroom CNRS-FMNT Dielectric deposition, Metal deposition, Metrology / Characterisation, Others, Physical/Structural, Plasma etching, Processing/Fabrication Advanced sensing, Green electronics and substrates, Quantum and spin devices engineering, Sense, Sustain, ThinkMolecular Beam Epitaxy (MBE) for spintronics - the SPIN2D platform consists in a cluster of Mol...
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