Tag Archive for: Deposition of conventional spintronic materials by Sputtering Ion Beam Etching with in situ XPS analysis

Molecular Beam Epitaxy (MBE) for spintronics

Showroom CNRS-FMNT Dielectric deposition, Metal deposition, Metrology / Characterisation, Others, Physical/Structural, Plasma etching, Processing/Fabrication Advanced sensing, Green electronics and substrates, Quantum and spin devices engineering, Sense, Sustain, Think

Molecular Beam Epitaxy (MBE) for spintronics - the SPIN2D platform consists in a cluster of Mol...

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CNRS-FMNT

https://infrachip.eu/wp-content/uploads/2024/04/17-CNRS_FMNT_SPIN2D_SPINTEC.jpg 671 980 devinf20 https://infrachip.eu/wp-content/uploads/2024/01/infrachip-logo-3.png devinf202024-04-12 10:51:402024-05-22 08:17:55Molecular Beam Epitaxy (MBE) for spintronics