Scanning Electron Microscopy

Core competences offered:

• Scanning electron microscopic (SEM) imaging of different kind of samples;
• Energy dispersive X-ray spectroscopy (EDS) for elemental analysis;
• Focused Ion Beam (FIB), which allows, for example, cross-section cuts;
• 4 Kleindiek nanotechnik nanomanipulators for electrical measurements and sample manipulation (e.g., TEM lamella preparation). 4 Triaxial connectors for external semiconductor parameter analyzer (SPA)
• GIS for C, Pt and SiO₂ deposition and XeF₂ for Si selective etching

Major tools:

• Carl Zeiss Auriga Crossbeam
• Hitachi SEM Regulus8220
• Hitachi Tabletop TM3030 Plus

Carl Zeiss Auriga Crossbeam

• Main technical specifications
  • SEM column – Schottky Field Emitter, resolution of 1.0 nm @ 15 kV, 1.9 nm @ 1 kV, acceleration voltage between 0.1 and 30 kV
  • FIB column – Ga liquid metal ion source (LMIS), resolution <7 nm @ 30 kV, acceleration voltage between 1 and 30 kV, probe current between 1 pA and 50 nA
  • SE and EsB detectors – Everhart-Thornley type SE, In-lens SE and in-lens EsB. Mix-mode possible by tuning grid polarization of detectors
  • Large area EDS detector Oxford X-Max 150 with Aztec software for elemental and chemical analysis with high count rates and low beam current. Detection from beryllium (Be) to californium (Cf)
  • Microstructure characterization with Oxford Nordlys II-S EBSD, integrated with Aztec software
  • Gas injector system for SEM or FIB-assisted local deposition of C, Pt and SiO2, selective etching of dielectrics with XeF2, local charge compensation to reduce charging effects in non-conductive samples
  • Heating stage Kammrat & Weiss, for in-situ analysis under heating up to 1050 °C;
  • 4 Kleindiek nanotechnik nanomanipulators for electrical measurements of nanodevices and TEM lamela preparation
  • Load-lock chamber for fast and contamination free sample loading-unloading.
• Type of samples
  • Protocols for preparation of multiple forms of solid samples available (bulk, powder, thin film…), including biological samples (after dehydration)
  • Sample size from few mm up to approx 2”.

Hitachi SEM Regulus8220

• Main technical specifications
  • Cold field emission (CFE) gun optimized for low-voltage, high-resolution imaging with low aberration: 0.7 nm/1 kV and 0.6 nm/15 kV, and maximum magnification of 2 million times.
  • Acceleration voltages from 0.5 to 30 kV.
  • Maximum sample height: ≈1 cm, and diameter ≈5 cm.

Hitachi Tabletop TM3030 Plus

• Main technical specifications
• Acceleration voltages of 5 and 15 kV with magnifications of 15x to 60000x.
• Observation modes: BSE:Conductor/Standard/Charge-up Reduction;
• SE:Standard/Charge-up Reduction;
• Mix:Standard/Charge-up Reduction;
• SIGNAL SELECTION: BSE/SE/Mix;
• Maximum sample height: Up to 70mm in diameter and 50mm thickness.

A user will observe his samples using SEM, which allows for high-resolution imaging, and will measure the grain size of his film. After that, the samples will be analysed by EDS for elemental identification and quantification.

https://doi.org/10.1021/acsanm.8b00743

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