SHOWROOM

Welcome to the INFRACHIP showroom!

You will find here all our offer: infrastructures, tools or “know-how” you can get access to.

If you need more specific information, don’t hesitate to contact us.

INFRACHIP provides:

  • A network of approx. 8,000m2 of fully equipped cleanrooms for sensors (nanoelectrochemical, chemical, microfluidics, photonics based sensors, advanced biosensors, graphene enabled),
  • manufacturing line for advanced spintronics; Large scale production of organic layers (R2R pilot lines, gravure, slot die, screen printing, etc.);
  • R2R UV nanoimpriting lithography;
  • Laser and plasma assisted vacuum deposition techniques;
  • A wide range of sustainable circuits developed on paper or other recyclable substrates including sensors, TFTs, neuromorphics, energy harvesters and storage, antennas;
  • Full set of tools for processing of devices at high frequencies based on various semiconductor technologies such as SiC, GaAs, InP and GaN;
  • Miniature Wireless Sensor Network (WSN) optimized using a Multi-Paradigm Modelling (MPM) approach;
  • Monolithic microwave integrated circuit (MMIC) processing based on graphene circuits for telecommunications; pilot line for RF front end components (like RF resonators, antennas, etc.);
  • Facilities for the fabrication of flexible, polymer based optical components with free-of-form structure; large scale green inks/pastes production adaptable to various printing technologies;
  • Advanced characterization tools for materials and layers properties evaluation under various conditions; micro-transfer printing for SoC and facilities for hybrid SiP integration.

Foil Stepper EVG770

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Step+Repeat UV imprint machine for pattern upscaling to generate large flexible stamps for roll...
Access Provider / Facilities
JOANNEUM RESEARCH

NILcure® UV-imprint resins

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The NILcure® resin portfolio comprises photopolymers for UV imprint lithography. The resins of...
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JOANNEUM RESEARCH

Micro Array Spotter

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The Micro Array Spotter is equipped for printing of biomolecules mainly on foil based substrate...
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JOANNEUM RESEARCH

Electron beam lithography (RAITH/e-line)

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Electron beam lithography (EBL) is a method for creating ultra-fine, nanometer-sized structures...
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JOANNEUM RESEARCH