Electron beam lithography
Electron beam lithography is a precise technique for patterning with a nanometer resolution. The pattern can be transferred to the resist directly from the graphic file.
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Electron beam lithography is a precise technique for patterning with a nanometer resolution. The pattern can be transferred to the resist directly from the graphic file.
Dry etching processes using ICP RIE plasma tool. Tool allows for cryogenic temperature processing.
High-temperature processes (boron diffusion, oxidation, LPCVD, and thermal annealing) in furnace, and rapid thermal processing.
Analysis of the Energy Harvesters (EH) from theoretical, numerical and experimental standpoint. We can advise on a selection of the most optimal EH technique for user-defined case. Numerical modelling of the performance evaluation upon user-defined topologies is offered. Finally, we can provide characterisation to our EH laboratory.
We offer efficient and reproducible wet cleaning processes of photomasks and substrates, as well as wet etching of materials.
Layer deposition of metal and dielectric layers using magnetron sputtering and PECVD.
Silicon nitride passive photonic integrated circuits operating in VIS and C-band for user-defined applications. Custom design comprises elements defined in a library of building blocks or user-defined within design rules.
UV photolithography process with um resolution for patterning the predefined shapes in a photoresist.
Discrete and Silicon power management circuit for energy harvesting and micro-power management.
Energy source platform that can supplement battery operation
Tools, expertise and testbed to optimise WSN power and/or maximise energy harvested
Raman confocal microscope for characterisation of materials
TITLE: European Research Infrastructure on Semiconductor Chips
START-END: January 2024 – December2027
EU CONTRIBUTION: 14 457 463 €
TOPIC: HORIZON-INFRA-2023-SERV-01
Coordinator: Tyndall National Institute
INFRACHIP (2024-2027) has received funding from the European Union’s Horizon Europe research and innovation actions under GA No. 101131822
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