Maskless Laser Lithography
Maskless laser lithography system for creating high quality 1D, 2D and 2.5D microstructures
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Maskless laser lithography system for creating high quality 1D, 2D and 2.5D microstructures
The NILcure® resin portfolio comprises photopolymers for UV imprint lithography. The resins of this versatile product line are customizable to a wide range of customer-specific applications due to the tunability of mechanical, chemical and optical properties.
ASAP is a commercial raytracing software for simulating the behaviour of optical components or entire optical systems. This technique is based on the geometrical optical equations; therefore, the propagation of light is described in terms of rays, which are “traced” trough the simulation area. At suitable positions inside the optical system, the rays can be stopped and evaluated. Complemented by self-developed algorithms for calculation, design and optimization of optical components for tailored light management solutions.
The Micro Array Spotter is equipped for printing of biomolecules mainly on foil based substrates. The foil substrates can be transported through the machine in Roll-to-Roll mode.
The RMC Power Ultramicrotomy from Boeckeler is used to create cross-sections of materials or layer systems for quick and reliable quality/quantity assessments. These cross-sections have a uniform thickness and extremely smooth surfaces to be analysed by means of advanced techniques such as scanning and transmission electron microscopy or atomic force microscopy.
This offer is a combinatorial system from RAITH allowing for electron beam lithography system and scanning electron microscopy. The integrated SEM (ZEISS Gemini) is capable of high-resolution imaging down to nanometer-sized features.
Electron beam lithography (EBL) is a method for creating ultra-fine, nanometer-sized structures in modern nanotechnology. It is an important instrument in semiconductor technology, used to produce photomasks for photolithography, or stamps for other lithographic processes.
Micro-thermoelectric generator for energy harvesting from waste heat and micro-thermoelectric cooler (Peltier cell) on Si and other wafers for direct integration. Seebeck coefficient, electrical and thermal conductivity measurements of thermoelectric materials.
Bruker Atomic Force Microscope (AFM) – Dimension Icon
Access to Tyndall FlexiFab Clean Room for non-standard processing
TITLE: European Research Infrastructure on Semiconductor Chips
START-END: January 2024 – December2027
EU CONTRIBUTION: 14 457 463 €
TOPIC: HORIZON-INFRA-2023-SERV-01
Coordinator: Tyndall National Institute
INFRACHIP (2024-2027) has received funding from the European Union’s Horizon Europe research and innovation actions under GA No. 101131822
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