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A highly versatile scanning electron microscope that is used to chemically and structurally characterise the surface of samples. Special operation modes allow the characterisation of non-conductive or humid materials and imaging in a temperature range of -20 to 1500°C.
The INL Cleanroom offers a comprehensive set of equipment for thin-film deposition by PVD and CVD techniques.
Magnetic Material Characterisation – SPINCarac offers a suit of equipment dedicated to characterization of magnetic materials and micro or nano devices localized at Grenoble – FRANCE
Molecular Beam Epitaxy (MBE) for spintronics – the SPIN2D platform consists in a cluster of Molecular Beam Epitaxy reactors dedicated to the growth of 2D materials, especially transition metal (di)chalcogenides (TMDC) and topological insulators (TI), with in situ characterization tools. The platform counts also with the extended expertise on the growth and characterisation of these materials.
This tool consists of a scanning electronic microscope SEM equipped with a focalized ion beam FIB enabling the milling of materials
The Physico-chemical Characterisation – IMPACT platform integrates several physico-chemical characterization modules (XPS, Ellipsometry , Raman–PL) all connected virtually together via specific vacuum transfer systems (quasi-insitu concept), and compatible with small samples and wafers up to 300mm.
The bench is dedicated to RF characterizations of optoelectronic devices (lasers, modulators, detectors…)
Terahertz characterisation – PLATERA platform: Terahertz (50 GHz – 4 THz) characterization and imaging of materials and devices by using Time or Frequency Domain methods.
Temporally characterization of phenomena and dynamics in the picosecond range.
This bench is dedicated to measuring the mode profile of integrated waveguides
Thin-film Characterisation – m-line bench. This bench is used to characterize the thickness and index of refraction of transparent thin films. It can measure films whose thickness is in the range (100 nm – 10 µm) at wavelengths from 400 nm to 1.5 µm.
TITLE: European Research Infrastructure on Semiconductor Chips
START-END: January 2024 – December2027
EU CONTRIBUTION: 14 457 463 €
TOPIC: HORIZON-INFRA-2023-SERV-01
Coordinator: Tyndall National Institute
INFRACHIP (2024-2027) has received funding from the European Union’s Horizon Europe research and innovation actions under GA No. 101131822
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