Sense Archives - Page 9 of 9

Mode profile measurement

Showroom CNRS-FMNT Metrology / Characterisation, Optical Photonic sensing, Sense

This bench is dedicated to measuring the mode profile of integrated waveguides...

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CNRS-FMNT

Thin-film Characterisation

Showroom CNRS-FMNT Metrology / Characterisation, Optical, Physical/Structural Photonic sensing, Sense

Thin-film Characterisation - m-line bench. This bench is used to characterize the thickness and...

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CNRS-FMNT

Waveguides losses/gain measurement

Showroom CNRS-FMNT Metrology / Characterisation, Optical Photonic sensing, Sense

This bench aims to measure the optical losses or gain into integrated waveguides...

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CNRS-FMNT

Insulating Material Characterization

Showroom CNRS-FMNT Devices / Test structures, Electrical, Metrology / Characterisation Advanced sensing, Component Neuromorphic computing, Energy autonomy, Green electronics and substrates, Green sensors, Power, Sense, Stretchable and flexible sensors, Sustain, Think

This test bench is dedicated for characterizing the electrical properties of insulators within ...

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CNRS-FMNT

Test & Characterization Platform

Showroom CNRS-FMNT Devices / Test structures, Electrical, Magnetic, Mechanical, Metrology / Characterisation, Modelling / Database, Optical, Physical/Structural Advanced sensing, Connect, Energy autonomy, Green electronics and substrates, Green sensors, Photonic sensing, Power, Power electronics, RF components, RF front-end design, Sense, Stretchable and flexible sensors, Sustain

Test and Characterisation Platform - Electrical, optical and physical characterization of mater...

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CNRS-FMNT

Wet Chemistry

Showroom AMO GmbH Devices / Test structures, Dielectric deposition, Dry etching, e-beam lithography, Electrical, Magnetic, Mechanical, Metal deposition, Metrology / Characterisation, Modelling / Database, Optical, Optical lithography, Physical/Structural, Plasma etching, Processing/Fabrication, Wet etching Advanced sensing, Component Neuromorphic computing, Connect, Photonic sensing, Quantum and spin devices engineering, RF components, RF front-end design, Sense, Short-range optical communications, Stretchable and flexible sensors, Think

Wet bench for imprint processes: Arias Lithography wet bench: Arias Standard cleaning: Arias ...

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AMO GmbH

Dry Etching

Inductively Coupled Plasma Reactive Ion Etcher(ICP-RIE): Oxford Instruments PlasmaLab System 10...

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AMO GmbH

Deposition

Sputtering system: Creavac Creamet500s E-beam evaporator: FHR Star 200 EVA, Plasma-enhance...

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AMO GmbH

Advanced Lithography Tool

Electron Beam Lithography(EBL): Raith EBPG 5200 Photolithography(PL): Semi-Automatic Mask Ali...

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AMO GmbH

Characterization

Showroom AMO GmbH Dielectric deposition, Dry etching, e-beam lithography, Metal deposition, Optical lithography, Plasma etching, Processing/Fabrication, Wet etching Advanced sensing, Component Neuromorphic computing, Connect, Photonic sensing, Power, Quantum and spin devices engineering, RF components, RF front-end design, Sense, Short-range optical communications, Stretchable and flexible sensors, Sustain, Think

AMO runs a class 10 to class 1000 cleanroom with a total area of 400 m². High-end production f...

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AMO GmbH

Mode profile measurement

Thin-film Characterisation

Waveguides losses/gain measurement

Insulating Material Characterization

Test & Characterization Platform

Wet Chemistry

Dry Etching

Deposition

Advanced Lithography Tool

Characterization

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